EBL Electron Beam Lithography
Dischem Inc. supports EBL (Electron Beam Lithography) professionals with materials engineered for precision, repeatability, and control. Our HSQ resists feature low roughness, high etch resistance, and consistent exposure behavior, ensuring reliable patterning down to the nanometer scale. Ideal for both research and industrial use, Dischem’s electron-beam solutions enable advanced semiconductor, photonic, and microelectronic device fabrication, reflecting our dedication to quality and innovation in nanoscale processing technologies.
