Electron Beam Lithography Charge

Electron beam lithography charge can become a concern when electron exposure takes place on electrically insulated substrates. At DisChem, our DisCharge anti-charging agents are designed to help prevent charge accumulation during EBL. We developed these products to address a specific challenge within advanced lithography rather than offering a general-purpose chemistry. If charge buildup is affecting your process considerations, our DisCharge solutions provide a specialized option for supporting electron beam lithography on suitable insulated substrates.